HLA Exposure Tool

Technology #ua13-143

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Categories
Researchers
Thiago Jota
Graduate Assistant, Optical Sciences
Thomas Milster
Professor, Optical Sciences
Managed By
Amy Phillips
Sr. Licensing Manager (520) 621-9579

Invention:  Researchers at the University of Arizona have developed an interferometer that operates at 121.6 nm, wherein the sample is outside the vacuum and only the source itself is enclosed in a vacuum.  This allows the instrument to be used in lithography without the need to create a large vacuum chamber to hold the sample  and instrument during writing or inspection.  Non-destructive optical inspection techniques become viable with very high resolution and no need for a high vacuum.

 

Background:

Optical microscopes and interferometry are useful in life sciences, physical sciences and semi-conductor manufacturing.  It would be advantageous if a new interferometer system could be developed using vacuum ultraviolet wavelengths without the complicated and expensive equipment to support a high vacuum for the system.

 

Applications:

-interferometry

-lithography

-surface testing metrology

 

Advantages:

-No need for a vacuum environment for the sample.

-Very high resolution

-Non-destructive optical testing

 

 

Lead Inventor: Thomas Milster