Virtual Deflectometry Enclosure Screen

Case ID:
UA19-136
Description:

Invention:

A system designed to perform optical quality metrology on freeform or convex optics.  This system provides a full aperture surface reconstruction sag map of freeform surfaces. The method relies on the creation of virtual source enclosure that surrounds the unit under testing (UUT) and produces a virtual 2 Pi-steradian measurement range. 

 

Background:

Freeform optics provide many possibilities in the design of cutting-edge optical systems.  However, their fabrication and metrology are challenging. To verify the freeform shape, two non-contact optical metrology methods are commonly used for UUT, interferometry and deflectometry.  Interferometry offers high accuracy and precision in surface metrology.  However, this method relies on prohibitively expensive computer-generated holograms and requires a null setup to obtain accurate results.  Deflectometry is an alternative non-null test method that relies on rays leaving a source, being deflected by a UUT.  Convex optics both standard and freeform are highly challenging to measure. Interferometric approaches typically require measuring sub-apertures that are then stitched together. The required setup is not always a viable option. Deflectometry is used in 3D construction for surfaces up to weak convex surfaces; however; a full aperture optical precision test of general convex surfaces is yet to be achieved.

 

Applications:

•       Metrology of freeform and convex optics

 

Advantages:

•       Creates a full aperture surface sag map of freeform surfaces including highly convex surfaces

 

 

Patent Information:
For Information, Contact:
Kennedy Nyairo
Sr. Licensing Manager, Optical Sciences
The University of Arizona
knyairo@email.arizona.edu
Inventors:
Dae Wook Kim
Logan Graves
Keywords:
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