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Use of Catalyzed Hydrogen Peroxide (CHP) Chemical System for Stripping of Implanted State-of-the-Art UV Resists
This invention addresses the use of Catalyzed Hydrogen Peroxide (CHP) chemical systems at low temperatures, less than 80°C, for disrupting crust formed on deep UV resist layers so that the underlying resist layer can be removed easily. Systematic investigation of variables such as hydrogen peroxide and catalyst concentration and time has led to...
Published: 2/1/2024   |   Inventor(s): Srini Raghavan, Rajkumar Govindarajan, Manish Keswani
Keywords(s):  
Category(s): Technology Classifications > Engineering & Physical Sciences, Technology Classifications > Engineering & Physical Sciences > Semiconductors