Invention:
This technology measures and uses a radiance function to optimize an optical system to its phase mask. This function does not limit end users to a specific type of phase mask, thus providing the user with more flexibility. In addition, the radiance function data can be processed to emulate any phase mask and therefore works with a mask in an existing system while still producing improved imagery.
Background:
A common method for extending the depth of field of an optical instrument uses a cubic phase mask placed between the objective lens and the detector. Typical cubic phase masks require high-precision manufacturing, alignment, and testing. Once fabricated, the phase mask cannot be altered or easily replaced within a system, and has no option for the final user to tune the system and achieve a desired trade-off between resolution, minimum depth of field, magnification, etc.
Applications:
- Medical imaging
- Optical system simulation
Advantages:
- Does not require cubic phase masks to be completely accurate, as it can simulate the phase mask being used
- Easily delivered to the end user
- Eliminates the need for precision manufacturing
- Improved imaging of biological samples
- System agnostic
Status: issued U.S. patent #10,591,353 and 10,228,279
