High Refractive Index Photoresin for Nano 3D Printing

Case ID:

This technology is a new resin for use in two-photon lithography, which offers a refractive index higher than existing commercial resins. As a result, it greatly expands the capabilities of 3D printing at a nano scale.

Technologies such as two-photon lithography are 3D printing, or additive manufacturing, techniques that use lasers to change the chemical composition of a resin material into a harder material. Most 3D printing requires printing the structure one layer at a time, building it up layer-by-layer. Two-photon lithography, on the other hand, uses a laser to focus light at individual points in a material to harden the resin, and can result in structures that would not otherwise be possible to build in a layer-by-layer approach.


  • Rapid prototyping
  • Micro-optics
  • Photonic metamaterials
  • Nanostructures


  • High refractive index
  • Tunable: tailored refractive indices
Patent Information:
Contact For More Information:
Richard Weite
Senior Licensing Manager, College of Optical Sciences
The University of Arizona
Lead Inventor(s):
Pierre Blanche
Remington Ketchum
Pedro Alcaraz